Disordered and porous metal oxides are promising as earth-abundant and cost-effective {alternatives|options} to noble-metal electrocatalysts. Herein, we leverage non-saturated oxidation in plasma-enhanced atomic layer deposition to tune structural, mechanical, and optical properties of biphasic CoOx thin films, thereby tailoring their catalytic activities and chemical stabilities. To optimize the resulting film properties, we systematically {vary|differ} the oxygen plasma {power|energy} and exposure time {in the|within the|inside the} deposition {process|procedure|method|approach|course of action}. We {find|discover|locate|uncover|come across|obtain} that {short|brief|quick} exposure {times|occasions|instances} and low plasma powers incompletely oxidize the cobaltocene precursor to Co(OH){2|two} and {result in|lead to} the incorporation of carbon impurities. These Co(OH){2|two} films are {highly|extremely|very|hugely} porous and catalytically active, but their electrochemical stability is impacted by poor adhesion {to the|towards the|for the} substrate. In contrast, {long|lengthy|extended} exposure {times|occasions|instances} and {high|higher} plasma powers {completely|totally|entirely|fully|absolutely} oxidize the precursor to {form|type|kind} Co3O4, {reduce|decrease|minimize|lessen|lower|cut down} the carbon impurity incorporation, and {improve|enhance|boost|increase|strengthen} the film crystallinity. {While|Whilst|Although|Even though|When|Though} the resulting Co3O4 films are {highly|extremely|very|hugely} {stable|steady} {under|below|beneath} electrochemical {conditions|circumstances|situations}, {they are|they’re|they may be} characterized by low oxygen evolution reaction activities. To overcome these competing properties, we applied the established relation {between|in between|among|amongst|involving} deposition parameters and functional film properties to {design|style|design and style} bilayer films exhibiting simultaneously {improved|enhanced} electrochemical {performance|overall performance|efficiency|functionality} and chemical stability. The resulting biphasic films combine a {highly|extremely|very|hugely} active Co(OH){2|two} surface {with a|having a|using a} {stable|steady} Co3O4 interface layer. {In addition|Additionally|Furthermore|Moreover|Also}, these coatings exhibit minimal light absorption, {thus|therefore|hence|as a result} rendering them {well|nicely|effectively|properly} suited as protective catalytic layers on semiconductor light absorbers for application in photoelectrochemical devices. 2-Bromo-4,5-difluoropyridine structure 1415238-25-3 Chemical name PMID:32180353
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